This user has not added any information to their profile yet.
Plasma sources for material processing, functional film, Magnetron sputtering (RF and HiPIMS), and renewable energy
1. M. A. Hossain, T. Ide, K. Ikari, and Y. Ohtsu, “High-density radio-frequency magnetized plasma sputtering source with rotational square-shaped arrangement of rod magnets for uniform target utilization,” Vacuum, Vol. no. 128, pp. 219-225, Jun. 2016. (Scopus and Thomson Reuters indexed journal, Elsevier Pub.)
2. M. A. Hossain, Y. Ohtsu, and T. Tabaru, “Performance of a Gyratory Square-Shaped Capacitive Radio Frequency Discharge Plasma Sputtering Source for Materials Processing,” Plasma Chem. Plasma Process Vol. 37, pp. 1663–1677, 2017. (Scopus indexed and Thomson Reuters journal, Springer Pub.)
Edit Your Profile ? Please Login. Log In