Change your cover photo
Change your cover photo
Love to inspire and like to be inspired for higher study, research and career
This user account status is Approved

This user has not added any information to their profile yet.

PhD (studying), Saga University, Japan, MSc. Engg., and BSc. Engg. in Electrical and Electronic Engineering both from Rajshahi University of Engineering & Technology (RUET))
Assistant Professor (on study leave)
Department of Electrical and Electronic Engineering
(+81) 080 9064 4326, (+88) 01712498443

Plasma sources for material processing, functional film, Magnetron sputtering (RF and HiPIMS), and renewable energy

1. M. A. Hossain, T. Ide, K. Ikari, and Y. Ohtsu, “High-density radio-frequency magnetized plasma sputtering source with rotational square-shaped arrangement of rod magnets for uniform target utilization,” Vacuum, Vol. no. 128, pp. 219-225, Jun. 2016. (Scopus and Thomson Reuters indexed journal, Elsevier Pub.)
2. M. A. Hossain, Y. Ohtsu, and T. Tabaru, “Performance of a Gyratory Square-Shaped Capacitive Radio Frequency Discharge Plasma Sputtering Source for Materials Processing,” Plasma Chem. Plasma Process Vol. 37, pp. 1663–1677, 2017. (Scopus indexed and Thomson Reuters journal, Springer Pub.)
3. Tsubasa Ide, Md. Amzad Hossain, Yutaro Nakamura, Yasunori Ohtsu, “Rotational cross-shaped magnetized radio-frequency sputtering plasma source for uniform circular target utilization”, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol. 35, 061312 (2017). (Scopus and Thomson Reuters indexed journal, AIP/AVS Pub.)
4. Md. Amzad. Hossain and Yasunori Ohtsu, “RF magnetized ring-shaped plasma for target utilization obtained with circular magnet monopole arrangement,” Jpn. J. Appl. Phys., Vol. 57, 01AA05, 2018. (Scopus and Thomson Reuters indexed journal, IOP Sci. Pub.)

Edit Your Profile ? Please Login. Log In