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PhD (studying), Saga University, Japan, MSc. Engg., and BSc. Engg. in Electrical and Electronic Engineering both from Rajshahi University of Engineering & Technology (RUET))
Assistant Professor (on study leave)
Department of Electrical and Electronic Engineering
(+81) 080 9064 4326, (+88) 01712498443

Plasma sources for material processing, functional film, Magnetron sputtering (RF and HiPIMS), and renewable energy

1. M. A. Hossain, T. Ide, K. Ikari, and Y. Ohtsu, “High-density radio-frequency magnetized plasma sputtering source with rotational square-shaped arrangement of rod magnets for uniform target utilization,” Vacuum, Vol. no. 128, pp. 219-225, Jun. 2016. (Scopus and Thomson Reuters indexed journal, Elsevier Pub.)
2. M. A. Hossain, Y. Ohtsu, and T. Tabaru, “Performance of a Gyratory Square-Shaped Capacitive Radio Frequency Discharge Plasma Sputtering Source for Materials Processing,” Plasma Chem. Plasma Process Vol. 37, pp. 1663–1677, 2017. (Scopus indexed and Thomson Reuters journal, Springer Pub.)

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